| 题名 | Low-Temperature Crystallization of Hydrogenated Amorphous Silicon Induced by Nickel Silicide Formation |
| 作者 | Yunosuke Kawazu, Hiroshi Kudo, Seinosuke Onari and Toshihiro Arai |
| 杂志 | Jpn. J. Appl. Phys. |
| 年|卷|期 | 29,12,1990 |
| 页码 | 2698 |
| 链接 | http://iopscience.iop.org/1347-4065/29/12R/2698 |
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