题名 | Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2 |
作者 | D. R. Baer, M. H. Engelhard, A. S. Lea, P. Nachimuthu, T. C. Droubay, J. Kim, B. Lee, C. Mathews, R. L. Opila, L. V. Saraf, W. F. Stickle, R. M. Wallace and B. S. Wright |
杂志 | Journal of Vacuum Science & Technology A |
年|卷|期 | 2010|28 |
页码 | 1060 |
链接 | http://scitation.aip.org/content/avs/journal/jvsta/28/5/10.1116/1.3456123 |
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