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标题: Comparison of the sputter rates of oxide films relative to the sputter rate o... [打印本页]

作者: Anthea14    时间: 2013-11-5 23:48
标题: Comparison of the sputter rates of oxide films relative to the sputter rate o...
题名Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2
作者D. R. Baer, M. H. Engelhard, A. S. Lea, P. Nachimuthu, T. C. Droubay, J. Kim, B. Lee, C. Mathews, R. L. Opila, L. V. Saraf, W. F. Stickle, R. M. Wallace and B. S. Wright
杂志Journal of Vacuum Science & Technology A
年|卷|期2010|28
页码1060
链接http://scitation.aip.org/content/avs/journal/jvsta/28/5/10.1116/1.3456123


作者: jocktor    时间: 2013-11-5 23:48
http://dl.vmall.com/c08o19nl7e
作者: jocktor    时间: 2013-11-5 23:50
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