| 题名 | Reducing operation voltages by introducing a low-k switching layer in indium–tin-oxide-based resistance random access memory |
| 链接 | http://iopscience.iop.org/article/10.7567/APEX.9.061501/meta |
| 欢迎光临 科研速递论坛 (http://www.expaper.cn/) | Powered by Discuz! X2.5 |