题名 | Enhanced oxygen vacancy diffusion in Ta2O5 resistive memory devices due to infinitely adaptive crystal structure |
链接 | http://scitation.aip.org/content/aip/journal/jap/119/13/10.1063/1.4945579 |
欢迎光临 科研速递论坛 (http://www.expaper.cn/) | Powered by Discuz! X2.5 |